Electron Beam Evaporation

Like the V2000 series production sputtering systems, the e2000 production evaporators are individually configured around the end user's requirements.

The e2000 systems take advantage of the latest technology, with a wide range of available options for all your Electron Beam Evaporation system requirements.

Many options are available for the e2000 production evaporators, including:

  • Substrate heating (up to 650°C).

  • Single or multi-hearth e-beam guns (single up to 200cc capacity).

  • Substrate fixturing systems include planetary & rotary motion.

  • Multi-boat thermal evaporation.

  • Deposition rate monitors and control systems.

  • Substrate cleaning and Ion assisted deposition.

  • Reactive gas admission.

  • Cryo pumping or Turbopump & Polycold for fast pumpdown.

  • All systems are controlled by a PLC based Control System, via a built-in industrial PC or Human-Machine Interface (HMI).

  • Datalogging of all major process parameters