Scientific Vacuum Systems LTD

Confocal Sputtering

SVS's V6000 range of confocal sputter systems for research mirrors the production range. Featuring the same quality of design & components the V6000 research coaters are ideal for single wafer processing for universities and research laboratories.

Many options are available for the V6000 confocal sputter systems including:
2, 3, 4 or 6-inch diameter confocal sputter magnetron target options
Deposition monitoring & control
Designed to process a single 6-inch wafer or smaller multiple wafers
Ion Beam milling & Ion assisted deposition
DC, DC pulse, HIPIMS and RF sputter power supply options
Sputter-up or sputter-down configuration

V6000 confocal sputter systems:

Confocal System

V6000 confocal sputter systems:
Wet/dry roughing pump options from 20 m3.hr-1 to 110 m3.hr-1
Turbo/Cryo high vacuum pumping options from 400 ltrs.sec-1 to 2,200 ltrs.sec-1
Substrate rotation up to 50rpm
Glovebox connection options
Full CE marked

Sputtering Deposition

V6000 confocal sputter systems:
Substrate heating to 800°C or
Substrate cooling below 50°C during the most aggressive deposition processes
RF etch and biasing facility of substrate up to 600W including rotation, heating or cooling.
Baratron transducer pressure measurement of the process gas.

Magnetron Sputtering

V6000 confocal sputter systems:
Multiple process gases for reactive deposition using positive shut-off mass flow controllers.
Up or downstream pressure control.
Full system automation with colour touch screen pc and PLC control.
Datalogging of all major process parameters
Loadlock entry system for single or multiple wafer processing.

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