Scientific Vacuum Systems Limited
Ion Beam Milling Systems
To address the worldwide market requirements for Ion Beam Milling and Deposition Systems, Scientific Vacuum Systems Ltd have formed partnerships with several suppliers of KRI range of DC and RF Ion sources. Our organisations combine many years of experience in Ion Beam and Deposition Systems process knowledge and systems design.
We are one of the UK leading designers and manufacturers for ion beam milling systems.
Our Ion Beam Systems range from R&D through to medium and large scale batch production units, incorporating the latest Ion Source designs and technology.
Our standard range of ion beam systems along with further details on available features are listed below
ViB 400
ViB 1600
ViB 2000
ViB 3000
ViB Series ion source options:
RF Gridded Kaufman designed Ion source sizes available up to 30cm with a wide choice of patented self-aligning grid optics. LFN Plasma bridge neutralisation is provided as standard with the RFICP source for filamentless operation in reactive gas environments.
DC gridless high current, low energy Kaufman designed ion sources able to deliver exceptional high current over a wide area. Fully reactive gas compatible and are available in standard filament or hollow cathode filamentless versions.
ViB General System features and options:
Highly efficient cooling of the wafer temperature below 50oC during the most aggressive Ion Beam milling processes, safeguarding thermally sensitive substrates and photoresist materials.
